PVD technology represents a sustainable, fast and clean process. It consists
in a physical vapour high vacuum deposition of aluminium with a pureness
until to 99,9%.
In sputtering technology, the source of deposition is represented by a metal
plate (chrome, copper, brass, etc) or even precious metals like gold and
silver. The cohesion between the positivity of the gas and negativity of the
target inside the chamber, permits the position of a metal film on the entire
of surface, that guarantees mechanical and chemical performances over
time.
